TLDR
- ASML stock rises as Intel deploys High NA EUV for Panther Lake chips.
- Intel begins High NA EUV production on selected Intel 18A chip layers.
- High NA EUV supports denser chip designs and improved manufacturing.
- Intel reaches another milestone with commercial High NA EUV deployment.
- ASML advances semiconductor manufacturing through Intel production rollout.
ASML Holding N.V. (ASML) shares gained 0.49% to $1,784.37 after recovering from early losses during Wednesday’s session. The company also confirmed Intel Foundry now uses its High NA EUV technology on selected Intel 18A production layers. The update highlighted another step toward broader deployment of advanced lithography across semiconductor manufacturing.
Intel Uses High NA EUV for Panther Lake Production
Intel Foundry has started using ASML’s High NA EUV technology to manufacture selected layers of Intel Core Ultra Series 3 processors. The processors carry the Panther Lake codename and rely on the Intel 18A process node. The milestone places High NA EUV inside an active production environment instead of limited testing.
The deployment allows Intel to gather manufacturing data from actual production activities. Moreover, the companies expect the information to improve equipment setup, uptime, and process efficiency. The effort also supports future expansion of High NA EUV across additional manufacturing layers.
ASML developed High NA EUV to deliver higher resolution and improved pattern accuracy during chip production. Manufacturers can create smaller and denser semiconductor features with greater precision. The technology also supports future computing requirements, including artificial intelligence and advanced processing applications.
Long Partnership Supports Next Manufacturing Stage
ASML and Intel have worked together for decades to improve semiconductor lithography technologies. Their partnership has supported multiple generations of manufacturing equipment and production methods. Accordingly, the latest achievement extends that collaboration into High NA EUV manufacturing.
Intel integrated the industry’s first commercial High NA EUV lithography system during 2024 at its research facility in Hillsboro, Oregon. The installation established an important foundation for production qualification activities. Intel continued testing the technology before introducing it into selected manufacturing operations.
Intel also became the first company to install and complete acceptance testing for ASML’s second-generation TWINSCAN EXE:5200B system. The newer platform improves production output, overlay accuracy, and light source performance.The equipment strengthens manufacturing efficiency while supporting future semiconductor nodes.
Production Milestone Expands High NA EUV Adoption
Intel now ships high-volume logic products that include layers produced with High NA EUV technology. This achievement makes Intel the first company to reach commercial shipment using the advanced lithography platform.The production experience provides valuable operational data for future manufacturing improvements.
The manufacturing results support continued refinement of system performance across production facilities. Intel plans to develop future manufacturing options that improve chip density, flexibility, and overall performance. The work also builds a stronger foundation for upcoming semiconductor process technologies.
ASML’s stock reflected the announcement with a modest gain despite early trading weakness. The shares recovered steadily throughout the session before closing at $1,784.37, up 0.49%. The production milestone reinforces ASML’s position as a key supplier of advanced lithography systems for next-generation semiconductor manufacturing.
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